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Fabrication and evaluation of phase shift mask using platinum for high numerical aperture extreme ultraviolet lithography
- Authors
- 안진호
- Issue Date
- 27-Feb-2019
- Place
- San Jose Convention Center, San Jose, California, USA
- Conference Name
- 2019 SPIE Advanced Lithography
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)