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Low-damage etching of poly-Si and SiO2 via a low-energy electron beam in inductively coupled CF4 plasma
- Authors
- 정진욱
- Issue Date
- 13-Nov-2024
- Place
- Paradise Hotel Busan
- Conference Name
- Korean international semiconductor conference on manufacturing technology 2024
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)