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Remarkable stability and hydrogen resistance on high-mobility oxide TFTs via N2O plasma reactant in atomic layer deposition
- Authors
- 박진성
- Issue Date
- 25-Jun-2025
- Place
- ICC JEJU
- Conference Name
- ALD/ALE 2025
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)