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Microstructure and Eelectrical Properties of HfO2 Thin Films Using La(NO3)3·6H2O Solution as an Oxidant
- Authors
- 안진호
- Issue Date
- 16-Nov-2018
- Place
- Sapporo Park Hotel, Sapporo, Japan
- Conference Name
- MNC 2018
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)