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Effect of RF bias frequency and gas pressure on discharge mode transition in an inductively coupled plasma
- Authors
- 정진욱
- Issue Date
- 7-Nov-2018
- Place
- Oragon convention center, Portland
- Conference Name
- Gaseous Electronics Conference
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)