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Work-Function Modulation and Electrical Stress Immunity of Fully Depleted SOI (FDSOI) Tunnel Field Effect Transistor (TFET) with Plasma Enhanced Atomic Layer Deposited (PEALD) TiN Gate Electrode
- Authors
- 최창환
- Issue Date
- 12-Jul-2018
- Place
- KINTEX, ILSAN, Korea
- Conference Name
- Nano Korea 2018
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)