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Low temperature SiOx thin film deposited by plasma enhanced atomic layer deposition for thin film encapsulation applications
- Authors
- 박진성
- Issue Date
- 16-Nov-2017
- Place
- 경주, 현대호텔
- Conference Name
- 2017년도 추계 학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)