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The Effect of O2 Plasma Etching Process to Remove Residue on the Trench Patterned Structures
- Authors
- 최창환
- Issue Date
- 31-Aug-2017
- Place
- Kyoto, Japan
- Conference Name
- International Union of Material Research Society-International Conference of Advanced Materials (IUMRS-ICAM)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)