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Vth Modulation of HfO2-MOSFETs with ALD TiN Using TiCl4 and NH3

Authors
최창환
Issue Date
15-Feb-2017
Publisher
한국반도체산업협회/한국반도체협회/대한전자공학회
Citation
한국반도체학술대회
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/33720
Conference Name
한국반도체학술대회
Place
대명 비발디파크, 한국
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Choi, Chang hwan
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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