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Surface Smoothness Improvement of Atomic Layer deposited HfO2 Film via Inserting Al2O3 Thin Film with Layer-by-Layer
- Authors
- 안진호
- Issue Date
- 15-Feb-2017
- Place
- 강원도 대명비발디파크 메이플동 2층/3층
- Conference Name
- The 24th Korean Conference on Semiconductors
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)