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A Compact Hollow-Anode Discharge Source for Sputtering Processes

Authors
정규선
Issue Date
28-Sep-2016
Publisher
한국재료학회
Citation
The 6th International Conference on Microelectronics and Plasma Technology
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/35396
Conference Name
The 6th International Conference on Microelectronics and Plasma Technology
Place
Dream Center, Gyeongju, in Korea
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서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers

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Chung, Kyu Sun
서울 공과대학 (서울 전기공학전공)
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