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The Effect of N2O Plasma Treatment on Indium Oxide Thin Film Transistor by low temperature Atomic Layer Deposition
- Authors
- 박진성
- Issue Date
- 13-Mar-2016
- Place
- Shanghai International Convention Center
- Conference Name
- China Semiconductor Technology International Conference
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)