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Study of plasma parameters of low global warming potential gases and characteristics of silicon oxide etch in inductively coupled plasma
- Authors
- 정진욱
- Issue Date
- 28-Oct-2015
- Place
- Jeju, Korea
- Conference Name
- 14th International Union of Materials Research Societies-International Conference on Advanced Materials
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)