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The Growth Behavior and Film Properties of Conductive ALD SnOx Using TDMASn and Hydrogen Peroxide
- Authors
- 박진성
- Issue Date
- 30-Jul-2013
- Publisher
- AVS
- Citation
- 13th International Confernece on Atomic Layer Deposition
- Conference Name
- 13th International Confernece on Atomic Layer Deposition
- Place
- San diego, California
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Park, Jinseong
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)