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Poly-GaAs 채널을 갖는 3D NAND flash memory 전기적 특성 연구A investigation on electrical properties of poly-GaAs channel in 3D NAND flash memory

Other Titles
A investigation on electrical properties of poly-GaAs channel in 3D NAND flash memory
Authors
한성종오영택송윤흡
Issue Date
Nov-2016
Publisher
대한전자공학회
Citation
대한전자공학회 학술대회, pp.219 - 222
Indexed
OTHER
Journal Title
대한전자공학회 학술대회
Start Page
219
End Page
222
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/4884
ISSN
12296368
Abstract
In this paper, we investigated the threshold voltage (VT) dispersion and on-current in poly-GaAs used for a channel material in 3D NAND flash memory. Using simulation, stings of NAND flash memory with 12, 24, 36, and 48 cells were implemented and electrical properties were extracted. It is revealed that the on-current in poly-GaAs channel is larger than in poly-Si channel due to the difference in mobility. In addition, the VT dispersion tends to decrease as the numbers of stacked layers increase in case of poly-GaAs channel.
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