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A Etching Study of Sputtered TiN Gate Electrode

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dc.contributor.author최창환-
dc.date.accessioned2021-08-03T16:24:23Z-
dc.date.available2021-08-03T16:24:23Z-
dc.date.created2021-06-30-
dc.date.issued2011-10-28-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/53635-
dc.publisher대한금속재료학회-
dc.titleA Etching Study of Sputtered TiN Gate Electrode-
dc.typeConference-
dc.contributor.affiliatedAuthor최창환-
dc.identifier.bibliographicCitation대한금속재료학회 추계학술대회-
dc.relation.isPartOf대한금속재료학회 추계학술대회-
dc.citation.title대한금속재료학회 추계학술대회-
dc.citation.conferencePlace대전 컨벤션센터-
dc.type.rimsCONF-
dc.description.journalClass2-
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