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The effects of RF plasma power on Al2O3 films deposited at room-temperature (25C) by remote plasma atomic layer deposition (RPALD)
- Authors
- 전형탁
- Issue Date
- 24-Aug-2011
- Place
- 킨텍스
- Conference Name
- Nano Korea 2011
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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