Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Improved Al2O3 Dielectric Properties using Remote Plasma Atomic Layer Deposition with Negative-Biased Pulse-Mode Direct Current (DC) Power
- Authors
- 최창환
- Issue Date
- 6-Jul-2011
- Place
- Dalian (대련), China (중국)
- Conference Name
- The Third International Conference on Microelectronics and Plasma Technology
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)