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Real time dose monitoring system by sensing implanter current and biased pulse voltage in plasma source ion implantation
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정진욱 | - |
| dc.date.accessioned | 2021-08-03T17:19:02Z | - |
| dc.date.available | 2021-08-03T17:19:02Z | - |
| dc.date.created | 2021-06-30 | - |
| dc.date.issued | 2011-07-06 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/54799 | - |
| dc.publisher | chinese vacuum society | - |
| dc.title | Real time dose monitoring system by sensing implanter current and biased pulse voltage in plasma source ion implantation | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 정진욱 | - |
| dc.identifier.bibliographicCitation | the third international conference on microelectronics and plasma technology | - |
| dc.relation.isPartOf | the third international conference on microelectronics and plasma technology | - |
| dc.citation.title | the third international conference on microelectronics and plasma technology | - |
| dc.citation.conferencePlace | dalian, china | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)