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Real time dose monitoring system by sensing implanter current and biased pulse voltage in plasma source ion implantation
- Authors
- 정진욱
- Issue Date
- 6-Jul-2011
- Place
- dalian, china
- Conference Name
- the third international conference on microelectronics and plasma technology
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)