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Strong modification of the electron energy distribution function in inductive discharge in SF6/Ar plasmas due to additional capacitive bias with small power input
- Authors
- 정진욱
- Issue Date
- 4-Oct-2010
- Publisher
- American Physical Society
- Citation
- 63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas
- Conference Name
- 63rd Gaseous Electronics Conference & 7th International Conference on Reactive Plasmas
- Place
- Paris, France
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Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
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Related Researcher
- Chung, Chin Wook
- COLLEGE OF ENGINEERING (MAJOR IN ELECTRICAL ENGINEERING)