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Effects of Post Annealing on the Properties of AL2O3/HfO/ZnO Thin Film Transistor Deposition by Atomic Layer Deposition
- Authors
- 전형탁
- Issue Date
- 5-Nov-2009
- Place
- Mokpo National University, KOREA
- Conference Name
- GJ-NST 2009, International Conference on Nano Science and Nano Technology
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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