Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effects of Post Annealing on the Properties of AL2O3/HfO/ZnO Thin Film Transistor Deposition by Atomic Layer Deposition
- Authors
- 전형탁
- Issue Date
- 20091105
- Place
- Mokpo National University, KOREA
- Conference Name
- GJ-NST 2009, International Conference on Nano Science and Nano Technology
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)