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The Effect of Polyacrylamide on Removal Poly Si to SiO2 Selectivity in Poly Si CMP Process for NAND Flash Memory beyond 60nm
- Authors
- 백운규
- Issue Date
- 26-Apr-2008
- Place
- 서울대학교 공과대학
- Conference Name
- 2008년 한국세라믹학회 춘계총회 및 연구발표회
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Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
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Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)