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Development of attenuated PSM mask for extreme ultra violet lithography with minmized mask shadowing effect
- Authors
- 안진호
- Issue Date
- 20080220
- Place
- 보광 휘닉스파크
- Conference Name
- 제15회 반도체 학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)