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Memory characteristics of Cobalt-Silicide nanocrystals embedded in HfO2 gate oxide for nonvoltiel flash devices

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dc.contributor.author홍진표-
dc.date.accessioned2021-08-04T00:22:00Z-
dc.date.available2021-08-04T00:22:00Z-
dc.date.issued20080214-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/65486-
dc.description.abstract1-
dc.titleMemory characteristics of Cobalt-Silicide nanocrystals embedded in HfO2 gate oxide for nonvoltiel flash devices-
dc.typeConference-
dc.citation.conferenceName한국진공학회 동계정기학술대회-
dc.citation.conferencePlace단국대학교 죽전캠퍼스-
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서울 자연과학대학 > 서울 물리학과 > 2. Conference Papers

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