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Effect of oxidant on properties of ultra thin HfO2 films grown by atomic layer deposition
- Authors
- 안진호
- Issue Date
- 8-Aug-2005
- Place
- San Jose, USA
- Conference Name
- AVS 5th International Conference on Atomic Layer Deposition
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)