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The effects of nitrogen and silicon profile on high-k MOSFET performance and Bias Temperature Instability

Authors
최창환
Issue Date
17-Jun-2004
Publisher
IEEE
Citation
Symposium on VLSI Technology (VLSI)
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/74397
Conference Name
Symposium on VLSI Technology (VLSI)
Place
Honolulu, USA
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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