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Atomic Layer Etching of Silicon Oxide with CF3I and O2 Plasma

Authors
안진호
Issue Date
4-Oct-2020
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/7605
Place
미국
Conference Name
PRiME 2020
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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