Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Atomic Layer Deposition (ALD) of high-k gate oxide
- Authors
- 전형탁
- Issue Date
- 26-Apr-2002
- Place
- 창원대학교
- Conference Name
- 2002 춘계 금속학회 학술대회
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.