Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Characterization and electrical properties of ultra thin HfO2 gate dielectrics prepared by atomic layer deposition
- Authors
- 안진호
- Issue Date
- 20020401
- Place
- 샌프란시스코
- Conference Name
- MRS 2002 spring meeting
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)