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TiN diffusion barrier formation by pulsed source chemical vapor deposition method

Authors
전형탁
Issue Date
19980401
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/82441
Conference Name
MRS Symposium
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Jeon, Hyeongtag
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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