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High-k absorber binary intensity mask using nickel for high numerical aperture extreme ultraviolet lithography
- Authors
- 안진호
- Issue Date
- 1-Jul-2020
- Place
- 일산 KINTEX
- Conference Name
- NANO KOREA 2020
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)