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Fast Thermal Quenching on the Ferroelectric Al:HfO2 Thin Film with Record Polarization Density and Flash Memory Application
- Authors
- 최창환
- Issue Date
- 17-Jun-2020
- Place
- Virtual Conference
- Conference Name
- Symposium on VLSI Technology (VLSI)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Choi, Chang hwan
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)