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A comparative study on the adsorption of silicon tetrahalides toward low-temperature thermal atomic layer deposition of silicon nitride

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dc.contributor.author송봉근-
dc.date.available2020-07-10T04:01:30Z-
dc.date.created2020-07-08-
dc.date.issued2019-02-14-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/1932-
dc.language영어-
dc.language.isoen-
dc.publisher한국반도체학술대회-
dc.titleA comparative study on the adsorption of silicon tetrahalides toward low-temperature thermal atomic layer deposition of silicon nitride-
dc.typeArticle-
dc.contributor.affiliatedAuthor송봉근-
dc.identifier.bibliographicCitation한국반도체학술대회, v.0, no.0, pp.0 - 0-
dc.relation.isPartOf한국반도체학술대회-
dc.citation.title한국반도체학술대회-
dc.citation.volume0-
dc.citation.number0-
dc.citation.startPage0-
dc.citation.endPage0-
dc.type.rimsART-
dc.description.journalClass2-
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