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Effect of deposition rate of organic layer on electrical and optical characteristics of OLEDs

Authors
Lee, Young HwanKim, Weon JongKim, Tag YongYang, Jae HoonCho, Kyung SoonHong, Jin WoongShin, Jong YeolKim, Tae Wan
Issue Date
Jan-2007
Publisher
TAYLOR & FRANCIS LTD
Keywords
current density; deposition rate; luminance; OLEDs; roughnes
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.462, pp.143 - 148
Journal Title
MOLECULAR CRYSTALS AND LIQUID CRYSTALS
Volume
462
Start Page
143
End Page
148
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/23656
DOI
10.1080/07370650601013088
ISSN
1542-1406
Abstract
We investigated the effects of deposition rate on the electrical characteristics and optical characteristics of organic light-emitting diodes(OLEDs) in the ITO(indiumtin-oxide) N,N'-diphenyl-N,N'-bis(3-methyphenyl)-1,1'-biphenyl-4,4'-diamine(TPD)/ tris(8-hydroxyquinoline) aluminum (Alq(3))/Al device. We measured current density, luminous flux and luminance characteristics of devices by varying deposition rates of TPD and Alq3. It has been found that optimal deposition rate of TPD and Alq(3) was 1.5 angstrom/s. AFM measurement shows that surface roughness of the deposited film was the lowest when the deposition rate was 1.5 angstrom/s.
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