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RF 마그네트론 스퍼터링을 이용한 태양전지용 질화 실리콘 반사방지막Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering
- Other Titles
- Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering
- Issue Date
- 2007
- Publisher
- 한국세라믹학회
- Keywords
- AR coating (anti-reflection coating); Silicon nitride; Solar cell; RF magnetron sputtering
- Citation
- 한국세라믹학회지, v.44, no.10, pp.585 - 588
- Journal Title
- 한국세라믹학회지
- Volume
- 44
- Number
- 10
- Start Page
- 585
- End Page
- 588
- ISSN
- 1229-7801
- Abstract
- Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a Si3N4 target. The best result was obtained at the sputtering condition of 340W RF power, 5 mtorr Ar atmosphere, 100 o C substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index, 0.21 absorption coefficient at 66.6 nm thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.
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Related Researcher
- Hwang, Jin ha
- Engineering (Advanced Materials)