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Effects of SAMs treatment by ALD on the performance of organic thin film transistors

Authors
Kim, H.Park, J.Bong, K.-W.Kang, J.-M.Kim, H.-M.Choi, J.-S.
Issue Date
2006
Keywords
ALD; OTFTs; Pentacene; PVP; SAMs; Surface treatment
Citation
SID Conference Record of the International Display Research Conference, pp.326 - 328
Journal Title
SID Conference Record of the International Display Research Conference
Start Page
326
End Page
328
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/25086
ISSN
1083-1312
Abstract
The characteristics of OTFTs have been improved by using SAMs that were formed by atomic layer deposition which is an ultra-thin film deposition technique. SAMs make pentacene be deposited in the upright order on the gate insulator. The operational characteristic improvements of the OTFTs with the SAM will be discussed. © 2006 SID.
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