Significant Reduction of 1/f Noise in Organic Thin-Film Transistors with Self-Assembled Monolayer: Considerations of Density-of-States
- Authors
- Shin, Wonjun; Bae, Jisuk; Park, Joon Hyung; Lee, Jong-Ho; Kim, Chang-Hyun; Lee, Sung-Tae
- Issue Date
- 1-Apr-2024
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Keywords
- density of states; low-frequency noise; Organic thin-film transistor (OTFT)
- Citation
- IEEE Electron Device Letters, v.45, no.4, pp 1 - 1
- Pages
- 1
- Journal Title
- IEEE Electron Device Letters
- Volume
- 45
- Number
- 4
- Start Page
- 1
- End Page
- 1
- URI
- https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/32745
- DOI
- 10.1109/led.2024.3368129
- ISSN
- 0741-3106
- Abstract
- This study investigates the low-frequency noise characteristics of the p-type organic thin-film transistors (OTFTs) with dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene (DNTT) by considering density-of-states (DOS). The OTFTs are fabricated with and without a self-assembled monolayer (SAM) on the SiO2 gate dielectrics. A significant reduction of 1/f is observed in the OTFTs with SAM compared to those without SAM. Moreover, this reduction is more pronounced in the high drain current region, indicating that the excess noise is reduced due to the lower DOS resulting from the introduction of SAM. © 1980-2012 IEEE.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - ETC > 1. Journal Articles
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.