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Significant Reduction of 1/f Noise in Organic Thin-Film Transistors with Self-Assembled Monolayer: Considerations of Density-of-States

Authors
Shin, WonjunBae, JisukPark, Joon HyungLee, Jong-HoKim, Chang-HyunLee, Sung-Tae
Issue Date
1-Apr-2024
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Keywords
density of states; low-frequency noise; Organic thin-film transistor (OTFT)
Citation
IEEE Electron Device Letters, v.45, no.4, pp 1 - 1
Pages
1
Journal Title
IEEE Electron Device Letters
Volume
45
Number
4
Start Page
1
End Page
1
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/32745
DOI
10.1109/led.2024.3368129
ISSN
0741-3106
Abstract
This study investigates the low-frequency noise characteristics of the p-type organic thin-film transistors (OTFTs) with dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene (DNTT) by considering density-of-states (DOS). The OTFTs are fabricated with and without a self-assembled monolayer (SAM) on the SiO2 gate dielectrics. A significant reduction of 1/f is observed in the OTFTs with SAM compared to those without SAM. Moreover, this reduction is more pronounced in the high drain current region, indicating that the excess noise is reduced due to the lower DOS resulting from the introduction of SAM. © 1980-2012 IEEE.
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