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A Sensitivity-controllable Shear-stress Sensor with 2 Sets of+45/-45 Degree Semiconductor Resistor-sensor Pair

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dc.contributor.authorCho, Chun-Hyung-
dc.contributor.authorCha, Ho-Young-
dc.contributor.authorSung, Hyuk-Kee-
dc.date.available2020-07-10T04:28:59Z-
dc.date.created2020-07-06-
dc.date.issued2018-04-
dc.identifier.issn1598-1657-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/3875-
dc.description.abstractIn this paper, we investigated the most enhanced shear-stress sensor by using 2 mid-points measurements in a separate +/- 45 degrees semiconductor resistor-sensor pair. Compared to our latest works, we added an additional +/- 45 degrees semiconductor resistor-sensor pair upside down, and the sensitivity was observed to be significantly increased approximately by 100% (2 times) compared to the result for our latest work. Also, we validated our results analytically by error analysis in sensitivity. Furthermore, we proposed a simple and efficient measurement-technique for the shear-stress calculation in which we just needed to measure voltage between the midpoints without the need for calculating the voltage ratio in each resistor-sensor pair. By this technique, we could increase the shear-sensitivity by controlling the common applied voltage between the sensor pairs. As an example, for the applied voltage of 8V between the pair, the sensitivity showed a significant increase by 300 % (4 times).-
dc.language영어-
dc.language.isoen-
dc.publisherIEEK PUBLICATION CENTER-
dc.subjectSILICON-
dc.titleA Sensitivity-controllable Shear-stress Sensor with 2 Sets of+45/-45 Degree Semiconductor Resistor-sensor Pair-
dc.typeArticle-
dc.contributor.affiliatedAuthorCho, Chun-Hyung-
dc.contributor.affiliatedAuthorCha, Ho-Young-
dc.contributor.affiliatedAuthorSung, Hyuk-Kee-
dc.identifier.doi10.5573/JSTS.2018.18.2.139-
dc.identifier.scopusid2-s2.0-85046480269-
dc.identifier.wosid000432340100003-
dc.identifier.bibliographicCitationJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE, v.18, no.2, pp.139 - 145-
dc.relation.isPartOfJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.citation.titleJOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE-
dc.citation.volume18-
dc.citation.number2-
dc.citation.startPage139-
dc.citation.endPage145-
dc.type.rimsART-
dc.type.docTypeArticle; Proceedings Paper-
dc.identifier.kciidART002338818-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusSILICON-
dc.subject.keywordAuthorSemiconductor stress-sensor-
dc.subject.keywordAuthorshear-stress-
dc.subject.keywordAuthorsensitivity-
dc.subject.keywordAuthorresistor sensor-
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