A Solution-Processed Operational Amplifier Using Direct Light-Patterned a-InGaZnO TFTs
DC Field | Value | Language |
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dc.contributor.author | Kim, Daejung | - |
dc.contributor.author | Kim, Yongchan | - |
dc.contributor.author | Choi, Keun-Yeong | - |
dc.contributor.author | Lee, Dayoon | - |
dc.contributor.author | Lee, Hojin | - |
dc.date.available | 2019-03-13T01:45:05Z | - |
dc.date.created | 2018-09-12 | - |
dc.date.issued | 2018-05 | - |
dc.identifier.issn | 0018-9383 | - |
dc.identifier.uri | http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/31712 | - |
dc.description.abstract | In this paper, we present a novel operational amplifier (op-amp) composed with solution-processed n-type amorphous indium-gallium-zinc-oxide (a-InGaZnO) thin-film transistors (TFTs). For patterning a-InGaZnO layer, we used direct light patterning method that drastically reduces the process steps and costs compared to conventional vacuum processes. The a-InGaZnO TFT-based op-amp was designed and fabricated on a glass substrate yielding a total gain of 24.6 dB, a cutoff frequency of 0.47 kHz, and a unit-gain frequency of 2.0 kHz at a supply voltage of +/- 15 V. Finally, by constituting a pulsewidth modulation controller with the proposed op-amp, we confirmed that the duty ratio and output voltage of the comparator and error amplifier could be altered with respect to the reference voltage, respectively. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.relation.isPartOf | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
dc.subject | THIN-FILM TRANSISTORS | - |
dc.subject | OXIDE SEMICONDUCTORS | - |
dc.title | A Solution-Processed Operational Amplifier Using Direct Light-Patterned a-InGaZnO TFTs | - |
dc.type | Article | - |
dc.identifier.doi | 10.1109/TED.2018.2817689 | - |
dc.type.rims | ART | - |
dc.identifier.bibliographicCitation | IEEE TRANSACTIONS ON ELECTRON DEVICES, v.65, no.5, pp.1796 - 1802 | - |
dc.description.journalClass | 1 | - |
dc.identifier.wosid | 000430698900021 | - |
dc.identifier.scopusid | 2-s2.0-85045311457 | - |
dc.citation.endPage | 1802 | - |
dc.citation.number | 5 | - |
dc.citation.startPage | 1796 | - |
dc.citation.title | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
dc.citation.volume | 65 | - |
dc.contributor.affiliatedAuthor | Lee, Hojin | - |
dc.type.docType | Article | - |
dc.description.isOpenAccess | N | - |
dc.subject.keywordAuthor | Amorphous indium-gallium-zinc oxide (a-InGaZnO) | - |
dc.subject.keywordAuthor | operational amplifier (op-amp) | - |
dc.subject.keywordAuthor | solution process | - |
dc.subject.keywordAuthor | thin-film transistors (TFTs) | - |
dc.subject.keywordPlus | THIN-FILM TRANSISTORS | - |
dc.subject.keywordPlus | OXIDE SEMICONDUCTORS | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
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