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A Solution-Processed Operational Amplifier Using Direct Light-Patterned a-InGaZnO TFTs

Authors
Kim, DaejungKim, YongchanChoi, Keun-YeongLee, DayoonLee, Hojin
Issue Date
May-2018
Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Keywords
Amorphous indium-gallium-zinc oxide (a-InGaZnO); operational amplifier (op-amp); solution process; thin-film transistors (TFTs)
Citation
IEEE TRANSACTIONS ON ELECTRON DEVICES, v.65, no.5, pp.1796 - 1802
Journal Title
IEEE TRANSACTIONS ON ELECTRON DEVICES
Volume
65
Number
5
Start Page
1796
End Page
1802
URI
http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/31712
DOI
10.1109/TED.2018.2817689
ISSN
0018-9383
Abstract
In this paper, we present a novel operational amplifier (op-amp) composed with solution-processed n-type amorphous indium-gallium-zinc-oxide (a-InGaZnO) thin-film transistors (TFTs). For patterning a-InGaZnO layer, we used direct light patterning method that drastically reduces the process steps and costs compared to conventional vacuum processes. The a-InGaZnO TFT-based op-amp was designed and fabricated on a glass substrate yielding a total gain of 24.6 dB, a cutoff frequency of 0.47 kHz, and a unit-gain frequency of 2.0 kHz at a supply voltage of +/- 15 V. Finally, by constituting a pulsewidth modulation controller with the proposed op-amp, we confirmed that the duty ratio and output voltage of the comparator and error amplifier could be altered with respect to the reference voltage, respectively.
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