Directed self-assembly of block copolymers for next generation nanolithography
- Authors
- Jeong, Seong-Jun; Kim, Ju Young; Kim, Bong Hoon; Moon, Hyoung-Seok; Kim, Sang Ouk
- Issue Date
- Dec-2013
- Publisher
- ELSEVIER SCI LTD
- Citation
- MATERIALS TODAY, v.16, no.12, pp.468 - 476
- Journal Title
- MATERIALS TODAY
- Volume
- 16
- Number
- 12
- Start Page
- 468
- End Page
- 476
- URI
- http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/39465
- DOI
- 10.1016/j.mattod.2013.11.002
- ISSN
- 1369-7021
- Abstract
- Directed self-assembly of block copolymers has received a great deal of research attention as a promising nanolithography to complement the intrinsic limitations of conventional photolithography. In this review, we highlight the recent progress in the development of the directed self-assembly process for practical utilization in semiconductor applications. Various advanced directed self-assembly approaches are examined, in which block copolymer self-assembly is synergistically integrated with conventional photolithography, such as ArF lithography or I-line lithography, via either epitaxial self-assembly or the graphoepitaxy principle. We focus on the practical advantages anticipated from directed self-assembly integration, such as pattern density multiplication, feature size uniformity improvement, line edge roughness reduction, as well as cost reduction. Additionally, a direction for future research on directed self-assembly is suggested with diverse potential applications.
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Collections - College of Engineering > ETC > 1. Journal Articles
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