Thermally induced self-assembly of poly(4-(tert-butyldimethylsiloxy)styrene-b-2-vinylpyridine) with extremely reduced roughness of patterns
- Authors
- Hur, Y.H.; Kang, B.-G.
- Issue Date
- 15-Aug-2021
- Publisher
- Elsevier Ltd
- Keywords
- Block copolymer; Directed self-assembly; Flory-Huggins interaction parameter; Line edge roughness; Line width roughness
- Citation
- European Polymer Journal, v.157
- Journal Title
- European Polymer Journal
- Volume
- 157
- URI
- http://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/41027
- DOI
- 10.1016/j.eurpolymj.2021.110653
- ISSN
- 0014-3057
- Abstract
- Directed self-assembly (DSA) of block copolymers (BCPs) is among the best alternative methods for achieving traditional top-down lithography because BCPs can form well-ordered nanostructures, such as spheres, cylinders, gyroids, and lamellae, with a controlled domain size (d) of 10–50 nm. However, regarding the pattern quality, further development of BCPs to satisfy industrial demands is still necessary. Here, a well-defined BCP, poly(4-(tert-butyldimethylsiloxy)styrene-b-2-vinylpyridine) (P4BDSS-b-P2VP), was synthesized to investigate the relationship between the Flory-Huggins interaction parameter (χ) and the self-assembled pattern quality by comparing it with poly(styrene-b-4-(tert-butyldimethylsiloxy)styrene) (PS-b-P4BDSS). It was confirmed that the higher χ value of P4BDSS-b-P2VP (0.128 at 25 °C) than that of PS-b-P4BDSS (0.0525 at 25 °C) calculated based on small-angle X-ray scattering (SAXS) analysis and Leibler's mean field theory was beneficial to pattern quality in DSA. The line edge roughness (LER) and line width roughness (LWR) of P4BDSS-b-P2VP were 1.33 and 2.73 nm, respectively, which were lower than those of PS-b-P4BDSS (2.29 and 3.52 nm, respectively). © 2021 Elsevier Ltd
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - College of Engineering > Department of Chemical Engineering > 1. Journal Articles
![qrcode](https://api.qrserver.com/v1/create-qr-code/?size=55x55&data=https://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/41027)
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.