Dual-Band Transmitter for Wireless Power Transfer to Biomedical Implant Applications
- Authors
- Le-Huu, H.; Seo, C.
- Issue Date
- Jun-2023
- Publisher
- Institute of Electrical and Electronics Engineers Inc.
- Keywords
- Antennas; Biomedical implants; Current distribution; dual -band transmitter (DB- tx); Dual band; Focusing; impedance matching network (IMN) wireless power transfer (WPT); Implants; Reflection coefficient; Transmitters
- Citation
- IEEE Antennas and Wireless Propagation Letters, v.22, no.6, pp 1461 - 1465
- Pages
- 5
- Journal Title
- IEEE Antennas and Wireless Propagation Letters
- Volume
- 22
- Number
- 6
- Start Page
- 1461
- End Page
- 1465
- URI
- https://scholarworks.bwise.kr/ssu/handle/2018.sw.ssu/44119
- DOI
- 10.1109/LAWP.2023.3246163
- ISSN
- 1536-1225
1548-5757
- Abstract
- This letter presents a dual-band transmitter (DB-Tx) for wireless power transfer (WPT) to biomedical implants. The DB-Tx operates at <inline-formula><tex-math notation=LaTeX>$\rm{1.7}~GHz$</tex-math></inline-formula> (LF-band) and <inline-formula><tex-math notation=LaTeX>$\rm{2.1}~GHz$</tex-math></inline-formula> (HF-band) to power implantable devices in deep and shallow implantation, respectively. A bipolar concentric loop (BCL) radiating plane is employed to obtain field-focusing characteristics at dual frequencies, and hence enhance the power transfer efficiency (PTE). Furthermore, a wide-band implantable receiver (Rx) is implemented to verify DB-Tx's performance. Experimental results show that, by utilizing the DB-Tx, the transmission range can be extended three times in HF-band and 30% in LF-band, compared to the Tx operating at a single frequency band. The Rx can receive power with the PTE of <inline-formula><tex-math notation=LaTeX>$-14.7~dB$</tex-math></inline-formula> and <inline-formula><tex-math notation=LaTeX>$-23~dB$</tex-math></inline-formula> at <inline-formula><tex-math notation=LaTeX>$\rm{10}~mm$</tex-math></inline-formula> and <inline-formula><tex-math notation=LaTeX>$\rm{40}~mm$</tex-math></inline-formula> implantation depth, respectively. IEEE
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