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Seed Repair by Electrodeposition in Pyrophosphate Solution for Acid Cu Superfilling

Authors
Choe, SeunghoeKim, Myung JunKim, Hoe ChulLim, TaehoPark, Kyung JuCho, Sung KiKim, Soo-KilKim, Jae Jeong
Issue Date
Apr-2013
Publisher
ELECTROCHEMICAL SOC INC
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.160, no.4, pp D202 - D205
Journal Title
JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume
160
Number
4
Start Page
D202
End Page
D205
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/15067
DOI
10.1149/2.028306jes
ISSN
0013-4651
1945-7111
Abstract
Seed layer repairing, a complementary technology to the fabrication of continuous Cu seed layers for acid Cu superfilling, was carried out in alkaline pyrophosphate solution by modified two-step electrodeposition. A short potential pulse was applied for nucleation prior to the second step, which was application of a lower potential for growth. This technique increased the surface coverage of damaged Cu seed layers from 78.10% to 99.46%. It was also shown to have the ability to repair an artificially damaged Cu seed layer with a 55 nm wide trench and to guarantee successful filling performance. (C) 2013 The Electrochemical Society. [DOI: 10.114912.028306jes] All rights reserved.
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