Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatmentopen access
- Authors
- Hwang, Chahwan; Heo, Jae Sang; Kim, Kyung-Tae; Kang, Yeo Kyung; Choi, Byungdoo; Kim, Yong-Hoon; Facchetti, Antonio; Park, Sung Kyu; Kim, Myung-Gil
- Issue Date
- Jan-2019
- Publisher
- ROYAL SOC CHEMISTRY
- Citation
- RSC ADVANCES, v.9, no.2, pp 730 - 737
- Pages
- 8
- Journal Title
- RSC ADVANCES
- Volume
- 9
- Number
- 2
- Start Page
- 730
- End Page
- 737
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/18614
- DOI
- 10.1039/c8ra08173e
- ISSN
- 2046-2069
2046-2069
- Abstract
- Deep ultraviolet (DUV)-treatment is an efficient method for the removal of high-energy-barrier polymeric or aliphatic organic ligands from nanomaterials. Regardless of morphology and material, the treatment can be used for nanoparticles, nanowires, and even nanosheets. The high-energy photon irradiation from low-pressure mercury lamps or radio frequency (RF) discharge excimer lamps could enhance the electrical conductivity of various nanomaterial matrixes, such as Ag nanoparticles, Bi2Se3 nanosheets, and Ag nanowires, with the aliphatic alkyl chained ligand (oleylamine; OAm) and polymeric ligand (polyvinyl pyrrolidone; PVP) as surfactants. In particular, Ag nanoparticles (AgNPs) that are DUV-treated with polyvinyl pyrrolidone (PVP) for 90min (50-60 degrees C) exhibited a sheet resistance of 0.54 (-1), while thermal-treated AgNP with PVP had a sheet resistance of 7.5 k (-1) at 60 degrees C. The simple photochemical treatment on various dimensionality nanomaterials will be an efficient sintering method for flexible devices and wearable devices with solution-processed nanomaterials.
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- Appears in
Collections - College of Natural Sciences > Department of Chemistry > 1. Journal Articles
- College of ICT Engineering > School of Electrical and Electronics Engineering > 1. Journal Articles
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