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Facile organic surfactant removal of various dimensionality nanomaterials using low-temperature photochemical treatmentopen access

Authors
Hwang, ChahwanHeo, Jae SangKim, Kyung-TaeKang, Yeo KyungChoi, ByungdooKim, Yong-HoonFacchetti, AntonioPark, Sung KyuKim, Myung-Gil
Issue Date
Jan-2019
Publisher
ROYAL SOC CHEMISTRY
Citation
RSC ADVANCES, v.9, no.2, pp 730 - 737
Pages
8
Journal Title
RSC ADVANCES
Volume
9
Number
2
Start Page
730
End Page
737
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/18614
DOI
10.1039/c8ra08173e
ISSN
2046-2069
2046-2069
Abstract
Deep ultraviolet (DUV)-treatment is an efficient method for the removal of high-energy-barrier polymeric or aliphatic organic ligands from nanomaterials. Regardless of morphology and material, the treatment can be used for nanoparticles, nanowires, and even nanosheets. The high-energy photon irradiation from low-pressure mercury lamps or radio frequency (RF) discharge excimer lamps could enhance the electrical conductivity of various nanomaterial matrixes, such as Ag nanoparticles, Bi2Se3 nanosheets, and Ag nanowires, with the aliphatic alkyl chained ligand (oleylamine; OAm) and polymeric ligand (polyvinyl pyrrolidone; PVP) as surfactants. In particular, Ag nanoparticles (AgNPs) that are DUV-treated with polyvinyl pyrrolidone (PVP) for 90min (50-60 degrees C) exhibited a sheet resistance of 0.54 (-1), while thermal-treated AgNP with PVP had a sheet resistance of 7.5 k (-1) at 60 degrees C. The simple photochemical treatment on various dimensionality nanomaterials will be an efficient sintering method for flexible devices and wearable devices with solution-processed nanomaterials.
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창의ICT공과대학 (전자전기공학부)
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