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Thermal Boundary Resistance Effect on Non-Equilibrium Energy Transport in Metal-Dielectric Thin Films Heated by Femtosecond Pulse Lasers

Authors
Lee, Jae BinLee, Seong Hyuk
Issue Date
Jul-2011
Publisher
JAPAN INST METALS
Keywords
femtosecond pulse laser; metal-dielectric interface; thermal boundary resistance (TBR); electron-phonon coupling factor; non-equilibrium; thin film
Citation
MATERIALS TRANSACTIONS, v.52, no.7, pp 1492 - 1499
Pages
8
Journal Title
MATERIALS TRANSACTIONS
Volume
52
Number
7
Start Page
1492
End Page
1499
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/21452
DOI
10.2320/matertrans.M2011021
ISSN
1345-9678
1347-5320
Abstract
The aim of this study is to investigate the effect of interfacial thermal boundary resistance (TBR) at a metal-dielectric interface on non-equilibrium energy transport in Au/SiO2 films heated by femtosecond pulse lasers. In this paper we suggest a combined set of numerical models that include the two-temperature model (TTM) for a metal side and the heat conduction equation for a dielectric layer. In addition, the TBRs between metal and nonmetal layers are calculated using thermal conductance, which is closely associated with the electron-phonon resistance and phonon-phonon resistance. Herein we present the transient and spatial distributions of TBR for a Au/SiO2 film irradiated by a 100-fs pulse laser with a 1053 nm wavelength, which are substantially affected by the phonon temperature and electron-phonon coupling. We also discuss the effect of laser fluence on the TBR and energy transport. The TBR rapidly increases the thermal conductivity at the interface, and becomes dominant at an early stage of laser irradiation over a very short period and then drastically decreases with time. Moreover, the TBR is substantially affected by the electron-phonon coupling and it should be considered for more accurate prediction of the lattice temperature drop at the interface. [doi:10.2320/matertrans.M2011021]
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Lee, Seong Hyuk
공과대학 (기계공학부)
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