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On the applicability of self-consistent global model for the characterization of Cl-2/Ar inductively coupled plasma

Authors
Efremov, A. M.Kim, Gwan-HaKim, Jong-GyuBogomolov, A. V.Kim, Chang-Il
Issue Date
Jan-2007
Publisher
ELSEVIER SCIENCE BV
Keywords
Cl-2/Ar plasma; plasma modeling; dissociation; ionization; rate coefficient; density
Citation
MICROELECTRONIC ENGINEERING, v.84, no.1, pp 136 - 143
Pages
8
Journal Title
MICROELECTRONIC ENGINEERING
Volume
84
Number
1
Start Page
136
End Page
143
URI
https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/24185
DOI
10.1016/j.mee.2006.09.020
ISSN
0167-9317
Abstract
This work reports the results on the influence of gas mixing ratio, gas pressure (0.26-3.3 Pa) and input power (400-900 W) on the Cl-2/ Ar plasma parameters in the planar inductively-coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probe and quadrupole mass-spectroscopy with plasma modelling given by the self-consistent global (0-dimensional) model with Maxwellian approximation for the electron energy distribution function. It was shown that, for the given range of experimental conditions, the model showed an outstanding agreement with the experiments and provided the near-to-adequate data on kinetics of plasma active species, their densities and fluxes. (c) 2006 Elsevier B.V. All rights reserved.
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