On the applicability of self-consistent global model for the characterization of Cl-2/Ar inductively coupled plasma
- Authors
- Efremov, A. M.; Kim, Gwan-Ha; Kim, Jong-Gyu; Bogomolov, A. V.; Kim, Chang-Il
- Issue Date
- Jan-2007
- Publisher
- ELSEVIER SCIENCE BV
- Keywords
- Cl-2/Ar plasma; plasma modeling; dissociation; ionization; rate coefficient; density
- Citation
- MICROELECTRONIC ENGINEERING, v.84, no.1, pp 136 - 143
- Pages
- 8
- Journal Title
- MICROELECTRONIC ENGINEERING
- Volume
- 84
- Number
- 1
- Start Page
- 136
- End Page
- 143
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/24185
- DOI
- 10.1016/j.mee.2006.09.020
- ISSN
- 0167-9317
- Abstract
- This work reports the results on the influence of gas mixing ratio, gas pressure (0.26-3.3 Pa) and input power (400-900 W) on the Cl-2/ Ar plasma parameters in the planar inductively-coupled plasma reactor. The investigation combined plasma diagnostics by Langmuir probe and quadrupole mass-spectroscopy with plasma modelling given by the self-consistent global (0-dimensional) model with Maxwellian approximation for the electron energy distribution function. It was shown that, for the given range of experimental conditions, the model showed an outstanding agreement with the experiments and provided the near-to-adequate data on kinetics of plasma active species, their densities and fluxes. (c) 2006 Elsevier B.V. All rights reserved.
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