Plasma parameters and volume kinetics in Cl-2/O-2 mixtures
- Authors
- Efremov, A; Kwon, KH; Park, CS; Choi, SI; Kim, C; Chai, SH
- Issue Date
- Jun-2005
- Publisher
- SPRINGER
- Citation
- JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, v.16, no.6, pp 315 - 321
- Pages
- 7
- Journal Title
- JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
- Volume
- 16
- Number
- 6
- Start Page
- 315
- End Page
- 321
- URI
- https://scholarworks.bwise.kr/cau/handle/2019.sw.cau/24594
- DOI
- 10.1007/s10854-005-1141-y
- ISSN
- 0957-4522
1573-482X
- Abstract
- We investigated plasma characteristics, plasma mass content and kinetic dependencies of both neutral and charged particle formation and decay in Cl-2/O-2 gas mixture. For these purposes we used a combination of experimental methods (optical emission spectroscopy, Langmuir probe) and a plasma modeling on the base of self-consistent solution of Boltzmann kinetic equation together with balance kinetic equations for neutral and charged particles in a quasi-stationary approximation. It was found that the change of O-2/(Cl-2+O-2) mixing ratio from 0 to 0.2 leads to an increase of electron average energy and electron energy distribution function (EEDF) deformation. The main mechanisms of Cl and O atom formation are the direct electron impact dissociation of corresponding molecules while the contribution of all possible "secondary" processes is not significant in the case of a relatively low O-2 addition. (C) 2005 Springer Science + Business Media, Inc.
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